Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films

Substrate Effects on the APCVD Growth of Titanium Nitride Films

Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks

With the continued miniaturization of devices in the semiconductor industry, atomic layer deposition (ALD) of silicon nitride thin films (SiNx) has attracted great interest due to the inherent benefits of this process compared to other silicon nitride thin film deposition techniques. These benefits include not only high conformality and atomic-scale thickness control, but also low deposition te...

Passivation of GaAs surface by atomic-layer-deposited titanium nitride

The suitability of titaniumnitride (TiN) for GaAs surface passivation and protection is investigated. A 2–6nm thick TiN passivation layer is deposited by atomic layer deposition (ALD) at 275 C on top of InGaAs/ GaAs near surface quantum well (NSQW) structures to study the surface passivation. X-ray reflectivity measurements are used to determine the physical properties of the passivation layer....

Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor

Highly uniform, smooth, and conformal coatings of tungsten nitride were synthesized by atomic layer deposition (ALD) from vapors of a novel precursor, bis(tert-butylimido)-bis(dimethylamido)tungsten, (BuN)2(Me2N)2W, and ammonia at low substrate temperatures (250-350 °C). This tungsten precursor is a low-viscosity, noncorrosive liquid with sufficient volatility at room temperature to be a vapor ...

Large-scale synthesis of uniform hexagonal boron nitride films by plasma-enhanced atomic layer deposition

Hexagonal boron nitride (h-BN) has been previously manufactured using mechanical exfoliation and chemical vapor deposition methods, which make the large-scale synthesis of uniform h-BN very challenging. In this study, we produced highly uniform and scalable h-BN films by plasma-enhanced atomic layer deposition, which were characterized by various techniques including atomic force microscopy, tr...